Code produit : EM-LiF-5N-Cu

Lithium Fluoride (LiF) is a relatively rare evaporation material used in some ultra-high vacuum systems and electron microscopy applications. LiF has a low vapor pressure and a high rate of decomposition, which makes it useful for preventing chemical deposition of other materials on substrates and insulation components.

Code produit : EM-La2O3-5N-Cu

Lanthanum oxide (La2O3) is an excellent evaporation material commonly used in vacuum deposition and thin film coating processes. It can be used to deposit a variety of thin-film materials, including conductive, dielectric and optical coatings.

Code produit : EM-CdS-5N-Cu

Cadmium sulfide (CdS) is a II-VI semiconductor material that is used for a variety of applications, including light sensors, solar cells, sensor components, and many others. CdS is deposited via vacuum evaporation, which is a process whereby a solid material is heated in a vacuum chamber until it sublimes and deposits on a substrate in a thin film.

Code produit : EM-BN-5N-Cu

Boron nitride (BN) is a synthetic material composed of boron and nitrogen. It is similar to graphite in structure and appearance, but exhibits different physical and chemical properties due to its chemical composition. BN is an electric insulator, and is highly stable in extreme temperatures, up to 4,000°C in a vacuum.

Code produit : EM-AlN-5N-Cu

Aluminum nitride (AlN) is an excellent high temperature material with great thermal properties and electrical insulation. It is widely used in the semiconductor and electronics industries as a protective surface coating during the evaporation or sputtering deposition of other materials.

Code produit : EM-ZnS-5N-Cu

Zinc sulfide is an inorganic compound typically used to make materials that can be evaporated to form thin films and coatings. Commonly used in electronics and optoelectronics, ZnS is a direct band gap material with a wide range of applications.